Electron Optical System

•    Electron Gun: Schottky emission source
•    Accelerating voltage: 500V to 1600V, 10V steps

•    Probe Current: 4~24pA with automated setting and measurement by Faraday cup

•    Electromagnetic Lens: 3-Stage Electromagnetic Lens
System with boosting voltage

•    Objective Lens: 4 opening click stop, heated aperture is selectable/adjustable outside the vacuum

•    Scan Coil: 2-Stage Electromagnetic Deflection

•    Astigmatism correction via 8-pole electromagnetic coil
•    Magnification = 1000x to >300000x

•    Field control method ; Continuously on for sample de-charging, at all voltages

•    Wafer imaging ability; Entire surface of 8” or 12” wafer

•    Depth of focus: ≥ 1.0um at 80000x magnification

•    Resolution: 3nm (800V) Retarding/Boosting Mode
•    Hitachi Probe Tip